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CMP PAD

KONI-2WK, KONI-3WK series

반도체 소재 중 가장 기술적 완성도를 요구하는 CMP PAD를 고객의 NEEDS에 부합되게 공급합니다.
: 200mm & 300mm W CMP, OXIDE CMP, Cu CMP

KONI PAD Structure

Top pad
PU Elastomer
micro pore
Groove (Centric circle, XY)
Adhesive
Reactive Hot Melt Adhesive
Bottom Pad
PU Foam : compressibility 1~3%
SP type (Foam on PET film) : compressibility 7~12%
PSA
PU Foam : compressibility 1~3%
SP type (Foam on PET film) : compressibility 7~12%

KONI PAD Feature

KONI PAD Feature – Line up

KONI PAD Feature – Hybrid pore pad

[Physical pore formation system]

Exothermic reaction of polyurethane (150 ℃ ↑)

* Concept : Micro pore forming with blowing agent (A) & pressure (B) control
=> Pore size : 20~50 um (fine pore forming)